in conjunction with
New Possibilities for Ultra-High Voltage Electron Microscopy
-In Commemoration of the 45th Anniversary of the HVEM Laboratory at Nagoya University-
,

2nd International Symposium on Creation of Life Innovation Materials
for Interdisciplinary and International Researcher Development (iLIM-2)
,
and
International Symposium of Growth, Characterization, and Simulation of Nitride Semiconductors

September 29 - October 1, 2017
Nagoya University, Nagoya, Japan

** What's New **
2017/06/08 Website for extended abstract PDF file upload is opend.
2017/06/02 Information of extended abstract submission is updated.
2017/05/16 Online registration website is opend.
** All the contributors are required to register by July 15, 2017.
2017/04/17 Deadline of abstract submission has been postponed to May 1, 2017.
2017/03/16 Hotel reservation website is opened. (Deadline: Sep. 10, 2017)
2017/02/02 Abstract submission website is opened. (Deadline: May 1, 2017)
2016/12/01 Call for papers is updated.
2016/11/09 Call for papers is ready for download in PDF format.

Organized by
Organizing committee of ICMaSS2017, Nagoya University
Institute of Materials and Systems for Sustainability, Nagoya University

Supported by
Research Foundation for the Electrotechnology of Chubu.,
Yashima Environment Technology Foundation,
(in no particular order)

Cooperated by
The Heat Transfer Society of Japan,
The Institute of Electrical Engineers of Japan Tokai Branch,
The Japanese Society of Microscopy,
The Japan Institute of Energy,
The Japan Institute of Light Metals,
Combustion Society of Japan,
(in no particular order)

Company advertisement
Kinoshita Rika Co., Ltd.,
JEOL Ltd.,
NIPPON ENGINEER CO., LTD.,
Advanced Characterization Nanotechnology Platform, Nagoya University,
FEI Company Japan Ltd.,
METAWATER Co., Ltd.,
SANYO SHOJI CO., LTD.,
TOYO Corporation,
TECHNO NISHIMURA CO., LTD.,
J-SCIENCE TOKAI Co., LTD.,
Gatan, Inc.
Real Computing, inc.
(in no particular order)